A method for growing a nitride compound semiconductor according to the present invention includes the step of growing a compound semiconductor expressed by a general formula Al.sub.x Ga.sub.1-x N (where 0.ltoreq..times..ltoreq.1) on a nitride compound semiconductor substrate at a temperature of about 900.degree. C. or more.

 
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> Method of forming semiconductive active area having a proximity gettering region therein and method of processing a monocrystalline silicon substrate to have a proximity gettering region

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