In accordance with the present invention, a method of fabricating a concave capacitor is provided. The concave capacitor of the present invention includes an adhesion spacer is formed between a concave pattern comprising an interlayer dielectric film and a lower electrode is provided. In the concave capacitor fabricating method, an interlayer dielectric film is formal semiconductor substrate. A concave pattern having a storage node e exposing part of the upper surface of the semiconductor substrate is form by patterning the interlayer dielectric film. An adhesion spacer is formed on t sidewall of the concave pattern exposed by the storage node hole. A lower electrode to cover the adhesion spacer and the upper surface of the semiconductor substrate exposed by the storage node hole is formed in the storage node hole